The Piezoresistive Performance of CuMnNi Alloy Thin-Film Pressure Sensors Prepared by Magnetron Sputtering
Viorel Braic
Round 1
Reviewer 1 Report
Comments and Suggestions for AuthorsThe article makes a good impression.
It contains new experimental data and is related to actual scientific directions. Appropriate techniques and methods were used in the work. The results are presented in good quality and their reliability is beyond doubt.
However, before the article is submitted to the publishing department, it is necessary to correct several comments.
1. Fig.1 should be rotated clockwise 90 degrees to eliminate the large empty space on the right side.
2. It remains unclear how the sputtering area of each target element was selected. Taking into account the fact that the sputtering coefficient is different for each element (Cu, Ni, Mn).
Comments for author File: 
Comments.pdf
English should be improved.
1. The meaning of the sentence is unclear (Line 32-33):
«Measure the current, voltage drop, surface brightness, and thermal expansion through the sample».
2. Line 32-33: «Based on this, this work used the magnetron sputtering to deposit manganin films».
I suggest: Based on this, magnetron sputtering was used in this work for deposition of manganin films.
3. Line 69-71. This sentence:
« The substrate bias voltage was –100 V, the deposition temperature was 200 ℃, the deposition chamber pressure was 0.2 Pa, the magnetron sputtering power supply was 2500 W, and the deposition was about 1 μm thick for 20 min»
is five separate sentences.
4. A lot of sentences are written in the future. Lines: 121, 122, 123,132,180,183, 246, 307.
It's not clear. Are these suggestions related to the results already obtained, or are the authors predicting an effect?
5. Lines 303-304: “The main conclusions are as follows: Increasing the content …”. After using a colon, a capital letter cannot be used.
Author Response
Please see the attachment.
Author Response File: Author Response.pdf
Reviewer 2 Report
Comments and Suggestions for Authors- lines 55-56: "Magnetron sputtering can form high-quality structural coatings with a compact structure, smooth surface, and no droplets" The information is too general, and has no bibliographic information. The film quality also depends on the specific material and suitable deposition conditions. Give example about piezoresistive high quality films obtained by this method.
- lines 89-90: ".....was used for annealing and heat treatment of the thin film samples". Instead of this incomplete info, describe the annealing and heat treatment processes.
- explain how the deposition parameters were chosen.
- line 101: "Cu (111) and Cu (200) orientation peaks". Peaks, not orientation peaks.
- related to XRD, the authors should calculate and present the values of the grain sizes.
- there are too many repetitions about the deposition method, which is not necessary.
- The manuscript presents two approaches: the study of the influence of Ni and secondly of the Mn content on the films' characteristics.
- The authors should explain how the content of the constant content of Mn was chosen when Ni content was varied and also how the constant content of Ni was chosen when Mn was varied. It is quite odd that the constant Ni content was 1 at.% when Mn was varied, while in the previous study (Ni content variation) other concentrations were analyzed.
- lines 243-244: "The effect of annealing treatment on the structure and piezoresistive properties of manganin films". This seems to be a title, not a sentence, and it has to have a number.
- The conclusion shows that the authors made a study aiming to be published, because no real information about a possible application is presented. This seems more like a laboratory study for students, not an application targeted and valuable research.
Comments on the Quality of English Language
- line 28: " Schmon[2], A obtained the solid phase temperature ...". Put the reference at the end of the phrase, always.
-line 32-33 ". Measure the current, voltage drop, surface brightness, and thermal expansion through the sample" This is not a sentence or a phrase, as it has no verb.
- line 43-44: " piezoresistive coefficient about 1×10-3 GP-1". GP-1 has no meaning. Write always correctly: 10-3 , GPa-1.
- line 63: "The experiment matrix adopted the following two types:" types of what? Maybe the "substrate" word is missing.
- line 71: " the deposition was about 1 μm thick for 20 min" The deposition is a process. Write correctly. instead give the deposition rate.
- line 104: "causing the XRD diffraction peak position to shift to a high angle". higher angle is the correct form.
Please revise all the text of the manuscript and write it correctly.
Author Response
Please see the attachment.
Author Response File: Author Response.pdf
