Deposition Process, Characterization and Performance of Thin Films
A special issue of Processes (ISSN 2227-9717). This special issue belongs to the section "Chemical Processes and Systems".
Deadline for manuscript submissions: 30 November 2024 | Viewed by 28
Special Issue Editor
Interests: atomic layer deposition; nano-thin film; inorganic; film characterization; catalytic properties of thin film materials
Special Issue Information
Dear Colleagues,
Over the last few decades, the study of thin films has driven many advances in various sectors, such as energy, information, agriculture, health, and environmental. Thin films can be prepared through many methods including spraying, wet chemical and electrochemical processes, and physical and chemical vapour deposition techniques; their performances are closely associated with the selected deposition method and growth process. The field of thin films has been defined as the confluence of materials science, surface science, and applied physics.
This Special Issue on “Deposition Process, Characterization and Performance of Thin Films” seeks high-quality submissions focusing on thin film synthesis, processes, characterization, and performanc. Topics include, but are not limited to, the following:
- Thin film materials (metallic, inorganic, organic, and composite) and their application performance;
- Thin film deposition methods and growth processes;
- Precursors and their application in thin film deposition.
Dr. Liyong Du
Guest Editor
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Processes is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- thin film
- material
- deposition
- process
- performace
- percursor
